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BIS seeks to achieve these aims by harmonizing controls with like-minded international locations. Accordingly, The usa is employing new controls, like a confined number of deemed export needs inside the here sectors of quantum pcs, resources, and linked Digital assemblies; aerospace know-how; and integrated circuit “development” or “output.” with this particular rule, BIS imposes controls on objects in these classes that warrant export controls thanks to countrywide protection considerations.
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BIS is incorporating ECCN 2E910 into the CCL to manage “technology”, not specified elsewhere, “specially made” or modified for the “improvement” or “output” of kit specified in ECCN 2B910.
z.four. All other commodities laid out in this ECCN that meet or exceed the efficiency parameters of ECCN 3A090.
b.one. “technological know-how” for the design of instruments, dies or fixtures “specially intended” for almost any of the following processes:
ECCN 3E905 isn't going to, such as, Command an integrated circuit design including the Bodily structure file in GDSII structure or EDA applications, or another technological know-how applied to provide the Actual physical structure file for built-in circuit design and style.” For these motives, BIS doesn't believe that There is certainly an overlap of controls between ECCN 3E905 and 3E001 or 3E002. marketplace is invited to post comments over the clarity on the Management textual content of the ECCN, in addition to the clarification assertion BIS enter while in the associated Manage paragraph. Because ECCN 3E905 was by no means intended to Management GAAFET architecture for 3D NAND, i.e.,
A license is required for regional steadiness reasons to export or reexport any merchandise issue on the EAR and stated around the Commerce Regulate listing (complement no.
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ID for this rule is: BIS-2024-0020. be sure to consult with RIN 0694-AJ60 in all responses. All filers utilizing the portal really should make use of the title of the individual or entity distributing the feedback as the title in their information, in accordance with the Guidelines under.
Masks and reticles are Each and every constructed from sophisticated many layer mask blanks. They must be created for “Excessive ultraviolet” (“EUV”) lithography. As masks and reticles are important parts for EUV lithography, BIS is adding 3B001.
The domestic enhancement of quantum information science and engineering (QIST) authorities, together with in quantum computing, is insufficient to fill America' QIST strategic goals. America will proceed to trust in international talent to fill crucial workforce gaps. at present, Significantly from the QIST talent formulated in the U.S. are foreign people. Foreign individuals are issue to visa prerequisites as administered with the Division of condition.
CC applies to “computer software” for computerized finger-print devices managed by 4A003 for CC explanations
file.4. Equipment made for machine processing using direct writing strategies, owning all of the next:
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